Electrolyte optimization for cathodic growth of zinc oxide films
Journal Article
·
· Journal of the Electrochemical Society
- Osaka Municipal Technical Research Inst. (Japan)
- Osaka Prefecture Univ., Sakai (Japan). Coll. of Engineering
Zinc oxide is of considerable interest to the optical and electronic industries, because of its electrical, optical, and acoustic characteristics. ZnO films can be prepared by several techniques, such as radio frequency (RF) magnetron sputtering, chemical vapor deposition, and molecular beam epitaxy. Preparation of oxide films by electrodeposition from aqueous solutions has several potential advantages over the other techniques. However, the formation of oxide films through electrochemical reactions have been demonstrated only on thallic oxide by Switzer and zirconium oxide by Gal-Or. In this work, the authors have prepared transparent ZnO films with optical bandgap energy of 3.3 eV by electrodeposition from an aqueous, 0.1 mol/liter zinc nitrate electrolyte. The deposition technology is still being developed. This paper reports the effects of the electrolyte concentration on the electrodeposition and properties of the ZnO films.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 220849
- Journal Information:
- Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 3 Vol. 143; ISSN JESOAN; ISSN 0013-4651
- Country of Publication:
- United States
- Language:
- English
Similar Records
Characterization of transparent zinc oxide films prepared by electrochemical reaction
Growth and characterization of electrosynthesised zinc oxide thin films
Preparation and characterization of transparent conductive ZnO:Ga films by DC reactive magnetron sputtering
Journal Article
·
Sun Jun 01 00:00:00 EDT 1997
· Journal of the Electrochemical Society
·
OSTI ID:516896
Growth and characterization of electrosynthesised zinc oxide thin films
Journal Article
·
Fri Jan 24 23:00:00 EST 2003
· Materials Research Bulletin
·
OSTI ID:20884636
Preparation and characterization of transparent conductive ZnO:Ga films by DC reactive magnetron sputtering
Journal Article
·
Thu Feb 14 23:00:00 EST 2008
· Materials Characterization
·
OSTI ID:21062191