Effects of growth temperature on Mg-doped GaN grown by ammonia molecular beam epitaxy
- Materials Department, University of California, Santa Barbara, 93106-5050 California (United States)
The hole concentration p in Mg-doped GaN films grown by ammonia molecular beam epitaxy depends strongly on the growth temperature T{sub GR}. At T{sub GR}=760 Degree-Sign C, GaN:Mg films showed a hole concentration of p=1.2 Multiplication-Sign 10{sup 18} cm{sup -3} for [Mg]=4.5 Multiplication-Sign 10{sup 19} cm{sup -3}, while at T{sub GR}=840 Degree-Sign C, p=4.4 Multiplication-Sign 10{sup 16} cm{sup -3} for [Mg]=7 Multiplication-Sign 10{sup 19} cm{sup -3}. Post-growth annealing did not increase p. The sample grown at 760 Degree-Sign C exhibited a low resistivity of 0.7 {Omega}cm. The mobility for all the samples was around 3-7 cm{sup 2}/V s. Temperature-dependent Hall measurements and secondary ion mass spectroscopy suggest that the samples grown at T{sub GR}>760 Degree-Sign C are compensated by an intrinsic donor rather than hydrogen.
- OSTI ID:
- 22080421
- Journal Information:
- Applied Physics Letters, Vol. 101, Issue 10; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMMONIA
ANNEALING
CRYSTAL GROWTH
DOPED MATERIALS
ELECTRIC CONDUCTIVITY
FILMS
GALLIUM NITRIDES
ION MICROPROBE ANALYSIS
LAYERS
MAGNESIUM
MAGNESIUM ADDITIONS
MASS SPECTRA
MASS SPECTROSCOPY
MOLECULAR BEAM EPITAXY
P-TYPE CONDUCTORS
SEMICONDUCTOR MATERIALS
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0400-1000 K