Micro-focusing 4 KeV to 65 KeV x-rays with bent Kirkpatrick-Baez mirrors
- Univ. of Chicago, IL (United States)
The authors present the test results of micro-focusing a continuous spectrum (4 KeV--65 KeV) of x-rays using two, 100 mm long, actively bent mirrors in a Kirkpatrick-Baez geometry. The mirrors are figured by applying in situ two different moments on the ends resulting in a surface figure that approximates an ellipse. They have demonstrated the ability to doubly focus NSLS bending magnet x-rays from 4 KeV to 13 KeV to a spot size less than 4 microns in diameter with a net gain of 2,000 over a similar size beam produced with slits. In the bending magnet test the beam was focused in the vertical direction with a high quality rhodium coated Si mirror with a RMS surface roughness and slope error less than 2 {angstrom} and 2 {micro}rad, respectively. The horizontal mirror consisted of uncoated float glass with significantly greater roughness and slope error. This combination of mirrors worked extremely well, pointing the direction for inexpensive micro-focusing optics. Vertical focusing tests were also performed using only the high quality Si mirror. On the bending magnet, x-rays were focused to 30 KeV using an incidence angle of 2 mrad achieving a best focus of 2.5 microns FWHM, resulting in a net gain of 91. Additional high energy focusing tests were carried out at the NSLS superconducting wiggler beamline X17. In this case a continuous x-ray spectrum was vertically focused using the Si mirror with an energy cutoff of 65 KeV (at an incident angle of 1 mrad) achieving a focal spot size of 3.3 microns FWHM and a net gain of 20.
- OSTI ID:
- 220778
- Report Number(s):
- CONF-950793-; ISBN 0-8194-1875-7; TRN: IM9620%%172
- Resource Relation:
- Conference: 40. annual meeting of the Society of Photo-Optical Instrumentation Engineers, San Diego, CA (United States), 9-14 Jul 1995; Other Information: PBD: 1995; Related Information: Is Part Of X-ray microbeam technology and applications; Yun, W. [ed.] [Argonne National Lab., IL (United States). Advanced Photon Source]; PB: 249 p.; Proceedings/SPIE, Volume 2516
- Country of Publication:
- United States
- Language:
- English
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