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Title: Brightness enhancement of plasma ion source by utilizing anode spot for nano applications

Abstract

Anode spots are known as additional discharges on positively biased electrode immersed in plasmas. The anode spot plasma ion source (ASPIS) has been investigated as a high brightness ion source for nano applications such as focused ion beam (FIB) and nano medium energy ion scattering (nano-MEIS). The generation of anode spot is found to enhance brightness of ion beam since the anode spot increases plasma density near the extraction aperture. Brightness of the ASPIS has been estimated from measurement of emittance for total ion beam extracted through sub-mm aperture. The ASPIS is installed to the FIB system. Currents and diameters of the focused beams with/without anode spot are measured and compared. As the anode spot is turned on, the enhancement of beam current is observed at fixed diameter of the focused ion beam. Consequently, the brightness of the focused ion beam is enhanced as well. For argon ion beam, the maximum normalized brightness of 12 300 A/m{sup 2} SrV is acquired. The ASPIS is applied to nano-MEIS as well. The ASPIS is found to increase the beam current density and the power efficiency of the ion source for nano-MEIS. From the present study, it is shown that the ASPIS canmore » enhance the performance of devices for nano applications.« less

Authors:
; ; ;  [1];  [2];  [3];  [4]
  1. Department of Nuclear Engineering, Seoul National University, Seoul 151-742 (Korea, Republic of)
  2. Samsung Electronics Co. Ltd., Gyeonggi 445-701 (Korea, Republic of)
  3. Research Institute of Nano Manufacturing System, Seoul National University of Science and Technology, Seoul 139-743 (Korea, Republic of)
  4. Nanobio Fusion Research Center, Korea Research Institute of Standards and Science, Daejeon 305-600 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22075531
Resource Type:
Journal Article
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 83; Journal Issue: 2; Conference: ICIS 2011: 14. international conference on ion sources, Giardini-Naxos, Sicily (Italy), 12-16 Sep 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0034-6748
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ANODES; APERTURES; ARGON IONS; BEAM CURRENTS; BEAM EXTRACTION; BRIGHTNESS; CURRENT DENSITY; EFFICIENCY; ION BEAMS; ION SOURCES; NANOSTRUCTURES; PLASMA; PLASMA DENSITY; SCATTERING

Citation Formats

Park, Yeong-Shin, Lee, Yuna, Chung, Kyoung-Jae, Hwang, Y S, Kim, Yoon-Jae, Park, Man-Jin, and Moon, Dae Won. Brightness enhancement of plasma ion source by utilizing anode spot for nano applications. United States: N. p., 2012. Web. doi:10.1063/1.3672472.
Park, Yeong-Shin, Lee, Yuna, Chung, Kyoung-Jae, Hwang, Y S, Kim, Yoon-Jae, Park, Man-Jin, & Moon, Dae Won. Brightness enhancement of plasma ion source by utilizing anode spot for nano applications. United States. doi:10.1063/1.3672472.
Park, Yeong-Shin, Lee, Yuna, Chung, Kyoung-Jae, Hwang, Y S, Kim, Yoon-Jae, Park, Man-Jin, and Moon, Dae Won. Wed . "Brightness enhancement of plasma ion source by utilizing anode spot for nano applications". United States. doi:10.1063/1.3672472.
@article{osti_22075531,
title = {Brightness enhancement of plasma ion source by utilizing anode spot for nano applications},
author = {Park, Yeong-Shin and Lee, Yuna and Chung, Kyoung-Jae and Hwang, Y S and Kim, Yoon-Jae and Park, Man-Jin and Moon, Dae Won},
abstractNote = {Anode spots are known as additional discharges on positively biased electrode immersed in plasmas. The anode spot plasma ion source (ASPIS) has been investigated as a high brightness ion source for nano applications such as focused ion beam (FIB) and nano medium energy ion scattering (nano-MEIS). The generation of anode spot is found to enhance brightness of ion beam since the anode spot increases plasma density near the extraction aperture. Brightness of the ASPIS has been estimated from measurement of emittance for total ion beam extracted through sub-mm aperture. The ASPIS is installed to the FIB system. Currents and diameters of the focused beams with/without anode spot are measured and compared. As the anode spot is turned on, the enhancement of beam current is observed at fixed diameter of the focused ion beam. Consequently, the brightness of the focused ion beam is enhanced as well. For argon ion beam, the maximum normalized brightness of 12 300 A/m{sup 2} SrV is acquired. The ASPIS is applied to nano-MEIS as well. The ASPIS is found to increase the beam current density and the power efficiency of the ion source for nano-MEIS. From the present study, it is shown that the ASPIS can enhance the performance of devices for nano applications.},
doi = {10.1063/1.3672472},
journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 2,
volume = 83,
place = {United States},
year = {2012},
month = {2}
}