The effect of applied electric field on pulsed radio frequency and pulsed direct current plasma jet array

Journal Article · Fri Jun 15 00:00:00 EDT 2012 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.4729730· OSTI ID:22072503

Hu, J T; Liu, X Y; Liu, J H; Xiong, Z L; Liu, D W; Lu, X P ^[1]; Iza, F; Kong, M G ^[2]

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1. National State Key Lab of Advanced Electromagnetic Engineering and Technology, Huazhong University of Science and Technology, WuHan, Hubei 430074 (China)
2. Department of Electronic and Electrical Engineering, Loughborough University, Leicestershire LE11 3TU (United Kingdom)

Here we compare the plasma plume propagation characteristics of a 3-channel pulsed RF plasma jet array and those of the same device operated by a pulsed dc source. For the pulsed-RF jet array, numerous long life time ions and metastables accumulated in the plasma channel make the plasma plume respond quickly to applied electric field. Its structure similar as 'plasma bullet' is an anode glow indeed. For the pulsed dc plasma jet array, the strong electric field in the vicinity of the tube is the reason for the growing plasma bullet in the launching period. The repulsive forces between the growing plasma bullets result in the divergence of the pulsed dc plasma jet array. Finally, the comparison of 309 nm and 777 nm emissions between these two jet arrays suggests the high chemical activity of pulsed RF plasma jet array.

• OSTI ID: 22072503
• Journal Information: Physics of Plasmas, Vol. 19, Issue 6; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ANODES
DIRECT CURRENT
ELECTRIC FIELDS
IONS
PLASMA
PLASMA JETS
PLUMES
RADIOWAVE RADIATION
RF SYSTEMS
THERMODYNAMIC ACTIVITY