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Fabrication of high aspect grating using bonded substrate for X-ray refraction imaging by Talbot-Lau interferometer

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4742289· OSTI ID:22069164
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  1. Medical Systems Research and Development Center, R and D Management Headquarters, FUJIFILM Corp., 798, Miyanodai, Kaisei-machi, Ashigarakami-gun, Kanagawa 258-8538 (Japan)
In order to improve the image quality of X-ray refraction images using a Talbot-Lau interferometer, we have been attempting to fabricate gratings with high aspect ratio. In our attempt, deep grooves of grating structure were channeled on a Si substrate bonded by Au diffusion bonding method, and the grooves were filled with Au where the Au layer used for the bonding Si substrate was acting as a seed layer of Au electroplating. From the results of a visibility measurement and a cross sectional SEM image, it was confirmed that the grooves with a pitch of 5.8 {mu}m and a depth of 100 {mu}m could be successfully filled with Au over a large area of 72 Multiplication-Sign 80 mm{sup 2}. Using this grating, the X-ray refraction images for the cartilage of a knee joint of a livestock pig could be obtained where SPS method was employed for the single-shot image acquisition.
OSTI ID:
22069164
Journal Information:
AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1466; ISSN APCPCS; ISSN 0094-243X
Country of Publication:
United States
Language:
English