An ice lithography instrument
Journal Article
·
· Review of Scientific Instruments
- Department of Physics, Harvard University, Cambridge, Massachusetts 02138 (United States)
- School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States)
- Department of Molecular and Cellular Biology, Harvard University, Cambridge, Massachusetts 02138 (United States)
We describe the design of an instrument that can fully implement a new nanopatterning method called ice lithography, where ice is used as the resist. Water vapor is introduced into a scanning electron microscope (SEM) vacuum chamber above a sample cooled down to 110 K. The vapor condenses, covering the sample with an amorphous layer of ice. To form a lift-off mask, ice is removed by the SEM electron beam (e-beam) guided by an e-beam lithography system. Without breaking vacuum, the sample with the ice mask is then transferred into a metal deposition chamber where metals are deposited by sputtering. The cold sample is then unloaded from the vacuum system and immersed in isopropanol at room temperature. As the ice melts, metal deposited on the ice disperses while the metals deposited on the sample where the ice had been removed by the e-beam remains. The instrument combines a high beam-current thermal field emission SEM fitted with an e-beam lithography system, cryogenic systems, and a high vacuum metal deposition system in a design that optimizes ice lithography for high throughput nanodevice fabrication. The nanoscale capability of the instrument is demonstrated with the fabrication of nanoscale metal lines.
- OSTI ID:
- 22062371
- Journal Information:
- Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 6 Vol. 82; ISSN 0034-6748; ISSN RSINAK
- Country of Publication:
- United States
- Language:
- English
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