Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm
Journal Article
·
· Review of Scientific Instruments
- Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)
- SPring-8/Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Sayo, Hyogo 679-5198 (Japan)
- SPring-8/RIKEN, 1-1-1 Kouto, Sayo, Hyogo 679-5198 (Japan)
- Research Institute for Electric Science, Hokkaido University, Kita 21 Nishi 10, Kita-ku, Sapporo 001-0021 (Japan)
In situ wavefront compensation is a promising method to realize a focus size of only a few nanometers for x-ray beams. However, precise compensation requires evaluation of the wavefront with an accuracy much shorter than the wavelength. Here, we characterized a one-dimensionally focused beam with a width of 7 nm at 20 keV using a multilayer mirror. We demonstrate that the wavefront can be determined precisely from multiple intensity profiles measured around the beamwaist. We compare the phase profiles recovered from intensity profiles measured under the same mirror condition but with three different aperture sizes and find that the accuracy of phase retrieval is as small as {lambda}/12.
- OSTI ID:
- 22062220
- Journal Information:
- Review of Scientific Instruments, Vol. 81, Issue 12; Other Information: (c) 2010 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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