Spectroscopic ellipsometry and x-ray photoelectron spectroscopy of La{sub 2}O{sub 3} thin films deposited by reactive magnetron sputtering
- Laboratory of Optical Materials and Structures, Institute of Semiconductor Physics, SB RAS, Novosibirsk 90, 630090 (Russian Federation)
Lanthanum oxide (La{sub 2}O{sub 3}) films were grown by the reactive dc magnetron sputtering and studied their structural, chemical and optical parameters. La{sub 2}O{sub 3} films were deposited onto Si substrates by sputtering La-metal in a reactive gas (Ar+O{sub 2}) mixture at a substrate temperature of 200 deg. C Reflection high-energy electron diffraction measurements confirm the amorphous state of La{sub 2}O{sub 3} films. Chemical analysis of the top-surface layers evaluated with x-ray photoelectron spectroscopy indicates the presence of a layer modified by hydroxylation due to interaction with atmosphere. Optical parameters of a-La{sub 2}O{sub 3} were determined with spectroscopic ellipsometry (SE). There is no optical absorption over spectral range {lambda}=250-1100 nm. Dispersion of refractive index of a-La{sub 2}O{sub 3} was defined by fitting of SE parameters over {lambda}=250-1100 nm.
- OSTI ID:
- 22054021
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 29, Issue 2; Other Information: (c) 2011 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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