Ultracompact/ultralow power electron cyclotron resonance ion source for multipurpose applications
- Laboratoire de Physique Subatomique et de Cosmologie de Grenoble, UJF-CNRS/IN2P3 - INPG, 53, rue des Martyrs, 38026 Grenoble Cedex (France)
In order to drastically reduce the power consumption of a microwave ion source, we have studied some specific discharge cavity geometries in order to reduce the operating point below 1 W of microwave power (at 2.45 GHz). We show that it is possible to drive an electron cyclotron resonance ion source with a transmitter technology similar to those used for cellular phones. By the reduction in the size and of the required microwave power, we have developed a new type of ultralow cost ion sources. This microwave discharge system (called COMIC, for COmpact MIcrowave and Coaxial) can be used as a source of light, plasma or ions. We will show geometries of conductive cavities where it is possible, in a 20 mm diameter chamber, to reduce the ignition of the plasma below 100 mW and define typical operating points around 5 W. Inside a simple vacuum chamber it is easy to place the source and its extraction system anywhere and fully under vacuum. In that case, current densities from 0.1 to 10 mA/cm{sup 2} (Ar, extraction 4 mm, 1 mAe, 20 kV) have been observed. Preliminary measurements and calculations show the possibility, with a two electrodes system, to extract beams within a low emittance. The first application for these ion sources is the ion injection for charge breeding, surface analyzing system and surface treatment. For this purpose, a very small extraction hole is used (typically 3/10 mm for a 3 {mu}A extracted current with 2 W of HF power). Mass spectrum and emittance measurements will be presented. In these conditions, values down to 1 {pi} mm mrad at 15 kV (1{sigma}) are observed, thus very close to the ones currently observed for a surface ionization source. A major interest of this approach is the possibility to connect together several COMIC devices. We will introduce some new on-going developments such as sources for high voltage implantation platforms, fully quartz radioactive ion source at ISOLDE or large plasma generators for plasma immersion, broad or ribbon beams generation.
- OSTI ID:
- 22053884
- Journal Information:
- Review of Scientific Instruments, Vol. 81, Issue 2; Conference: ICIS 2009: 13. international conference on ion sources, Gatlinburg, TN (United States), 20-25 Sep 2009; Other Information: (c) 2010 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
GENERAL PHYSICS
BEAM EXTRACTION
BEAM INJECTION
BREEDING
CAVITIES
CURRENT DENSITY
CYCLOTRON RESONANCE
ECR ION SOURCES
ELECTRIC POTENTIAL
ELECTRODES
GHZ RANGE
HIGH-FREQUENCY DISCHARGES
IONS
MASS SPECTRA
MICROWAVE RADIATION
PLASMA
QUARTZ
SURFACE IONIZATION
SURFACE TREATMENTS
VISIBLE RADIATION