The study of helicon plasma source

Journal Article · Mon Feb 15 04:00:00 EST 2010 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.3271172· OSTI ID:22053861

Tingting, Miao; Yong, Shang ^[1]; Hongwei, Zhao; Zhanwen, Liu; Liangting, Sun; Xuezhen, Zhang; Huanyu, Zhao ^[1]

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1. Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000 (China)

Helicon plasma source is known as efficient generator of uniform and high density plasma. A helicon plasma source was developed for investigation of plasma neutralization and plasma lens in the Institute of Modern Physics in China. In this paper, the characteristics of helicon plasma have been studied by using Langmuir four-probe and a high argon plasma density up to 3.9x10{sup 13} cm{sup -3} have been achieved with the Nagoya type III antenna at the conditions of the magnetic intensity of 200 G, working gas pressure of 2.8x10{sup -3} Pa, and rf power of 1200 W with a frequency of 27.12 MHz. In the experiment, the important phenomena have been found: for a given magnetic induction intensity, the plasma density became greater with the increase in rf power and tended to saturation, and the helicon mode appeared at the rf power between 200 and 400 W.

• OSTI ID: 22053861
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 2 Vol. 81; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ANTENNAS
ARGON
ELECTROMAGNETIC LENSES
INDUCTION
LANGMUIR PROBE
MHZ RANGE
PLASMA
PLASMA DENSITY
PLASMA PRODUCTION