Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Physical and optical properties of room temperature microwave plasma anodically grown TiO{sub 2}

Journal Article · · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
DOI:https://doi.org/10.1116/1.3154514· OSTI ID:22051000
;  [1]
  1. Energetic Materials Research and Testing Center, New Mexico Institute of Mining and Technology, Socorro, New Mexico 87801 (United States)

A dense, amorphous form of TiO{sub 2} produced by plasma assisted anodic oxidation of Ti was identified using infrared absorption, x-ray diffraction, x-ray reflectivity, atomic force microscopy, and ellipsometry. The films were grown by nominally room temperature processing. Comparison of the physical properties of the material is made with respect to existing data on plasma enhanced chemical vapor deposited TiO{sub 2} and new data obtained on electron beam evaporated TiO{sub 2}. Anodic TiO{sub 2} is found to be amorphous with a refractive index of the order of 2.33 as compared to 2.2 for plasma enhanced chemical vapor deposited films and 1.89 for electron beam evaporated TiO{sub 2} films. The density is measured to be 4.1 g/cm{sup 3}. Samples annealed up to 600 degree sign C in a N{sub 2} atmosphere for 1 h remained amorphous, the refractive index increasing to 2.38 and the density to 4.25 g/cm{sup 3}. The surface roughness remained almost unchanged consistent with the amorphicity. No evidence for the presence of crystalline rutile or anatase phases was detected. Furthermore, unlike plasma assisted chemical vapor deposited and electron beam evaporated TiO{sub 2} films, annealed anodic TiO{sub 2} showed no observable interaction with the Si substrate either during growth or following annealing.

OSTI ID:
22051000
Journal Information:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 4 Vol. 27; ISSN 1553-1813
Country of Publication:
United States
Language:
English

Similar Records

Structural evolution of TiO{sub 2} nanocrystalline thin films by thermal annealing and swift heavy ion irradiation
Journal Article · Wed Apr 01 00:00:00 EDT 2009 · Journal of Applied Physics · OSTI ID:21190123

Spatial extent of lithium intercalation in anatase TiO{sub 2}
Journal Article · Thu Aug 26 00:00:00 EDT 1999 · Journal of Physical Chemistry B: Materials, Surfaces, Interfaces, amp Biophysical · OSTI ID:696647

Spatial extent of lithium intercalation in anatase TiO[sub 2]
Journal Article · Thu Aug 26 00:00:00 EDT 1999 · Journal of Physical Chemistry B: Materials, Surfaces, Interfaces, amp Biophysical · OSTI ID:6105868