Study of the plasma parameters in a high-current pulsed magnetron sputtering system

Journal Article · Tue Mar 15 04:00:00 EDT 2011 · Plasma Physics Reports

DOI:https://doi.org/10.1134/S1063780X1101003X· OSTI ID:22047546

Odivanova, A N ^[1]; Podkovyrov, V G ^[2]; Sochugov, N S; Oskomov, K V ^[1]

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1. Russian Academy of Sciences, Institute of High-Current Electronics, Siberian Branch (Russian Federation)
2. Applied Electronics Ltd. (Russian Federation)

Results are presented from experimental studies of the current-voltage characteristics and spatial and temporal parameters of the plasma in a high-current pulsed magnetron sputtering system with a 10-cm-diameter plane disk cathode. It is shown that the plasma density in such a system is three orders of magnitude higher than that in conventional dc magnetron discharges and reaches 10{sup 13} cm{sup -3} at a distance of 250 mm from the cathode at a peak discharge current of 500 A. The plasma propagates from the cathode region at a velocity of 1 cm/{mu}s in the axial direction and 0.25 cm/{mu}s in the radial direction. Optical emission spectroscopy shows that the degree of plasma ionization increases severalfold with increasing discharge current, mainly at the expense of the sputtered material.

• OSTI ID: 22047546
• Journal Information: Plasma Physics Reports, Journal Name: Plasma Physics Reports Journal Issue: 3 Vol. 37; ISSN PPHREM; ISSN 1063-780X
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CATHODES
CHARGED-PARTICLE TRANSPORT
ELECTRIC CONDUCTIVITY
ELECTRIC CURRENTS
ELECTRIC DISCHARGES
ELECTRIC POTENTIAL
EMISSION SPECTROSCOPY
IONIZATION
MAGNETRONS
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
PLASMA PRODUCTION
SPUTTERING
VELOCITY