Measurement of the sheath capacitance of a planar probe
- Department of Electrical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791 (Korea, Republic of)
The sheath capacitance was measured on a planar probe dc-biased with respect to the plasma potential using the phase sensitive detection method in the region separated from the rf discharge plasmas by an immersed grid. It was observed that the sheath capacitance was negative when the collecting electrode of the probe was positioned downward toward the grid and biased near the plasma potential. This indicates that a double sheath had built up near the probe electrode. This tendency can be explained by the sheath capacitance, which is calculated using Poisson's equation with a non-zero electrical field and an ion velocity condition at the sheath edge.
- OSTI ID:
- 22047001
- Journal Information:
- Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 10 Vol. 18; ISSN PHPAEN; ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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