Formation of quasi-periodic nano- and microstructures on silicon surface under IR and UV femtosecond laser pulses
Journal Article
·
· Quantum Electronics (Woodbury, N.Y.)
Quasi-periodic nano- and microstructures have been formed on silicon surface using IR ( {lambda} Almost-Equal-To 744 nm) and UV ( {lambda} Almost-Equal-To 248 nm) femtosecond laser pulses. The influence of the incident energy density and the number of pulses on the structured surface topology has been investigated. The silicon nanostructurisation thresholds have been determined for the above-mentioned wavelengths. Modulation of the surface relief at the doubled spatial frequency is revealed and explained qualitatively. The periods of the nanostructures formed on the silicon surface under IR and UV femtosecond laser pulses are comparatively analysed and discussed.
- OSTI ID:
- 22043679
- Journal Information:
- Quantum Electronics (Woodbury, N.Y.), Vol. 41, Issue 9; Other Information: Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7818
- Country of Publication:
- United States
- Language:
- English
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