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Title: Formation and annealing of radiation defects in tin-doped p-type germanium crystals

Journal Article · · Semiconductors
;  [1]; ;  [2]
  1. Belarussian State University (Belarus)
  2. National Academy of Sciences of Belarus, Scientific and Practical Materials Research Center (Belarus)

The effect of tin on the formation and annealing of radiation defects in p-type germanium crystals irradiated with 6-MeV electrons at a temperature of 80 K is studied. It is shown that acceptor complexes SnV with a hole ionization enthalpy of 0.16 eV are dominant in irradiated Ge:(Sn, Ga) crystals after their heating to a temperature of 300 K. These complexes disappeared as a result of the annealing of irradiated crystals in the temperature range 30-75 Degree-Sign C. Annealing of irradiated crystals at temperatures in the range 110-150 Degree-Sign C brings about the formation of deep-level centers with a donor level at E{sub v} + 0.29 eV; this center is presumably related to a complex consisting of a tin atom and an interstitial gallium atom.

OSTI ID:
22038984
Journal Information:
Semiconductors, Vol. 46, Issue 5; Other Information: Copyright (c) 2012 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
Country of Publication:
United States
Language:
English

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