Synthesis and characterization of titanium-alloyed hematite thin films for photoelectrochemical water splitting

Journal Article · Thu Dec 15 04:00:00 EST 2011 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3671414· OSTI ID:22038813

Houwen, Tang ^[1]; Matin, M A ^[2]; Wang, Heli; Deutsch, Todd; Al-Jassim, Mowafak; Turner, John; Yan, Yanfa ^[1]

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1. National Renewable Energy Laboratory, 1617 Cole Boulevard, Golden, Colorado 80401 (United States)
2. University of Denver, Electrical Engineering Department, 2390 S. York Street, Denver, Colorado 80210 (United States)

We have synthesized pure and Ti-alloyed hematite thin films on F doped SnO{sub 2} coated glass substrates by radio frequency magnetron co-sputtering of iron oxide and titanium targets in mixed Ar/O{sub 2} and mixed N{sub 2}/O{sub 2} ambient. We found that the hematite films deposited in the N{sub 2}/O{sub 2} ambient exhibit much poorer crystallinity than the films deposited in the Ar/O{sub 2} ambient. We determined that Ti alloying leads to increased electron carrier concentration and crystallinity, and reduced bandgaps. Moreover, Ti-alloyed hematite thin films exhibited improved photoelectrochemical performance as compared with the pure hematite films: The photocurrents were enhanced and the photocurrent onset shifted to less positive potentials.

• OSTI ID: 22038813
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 12 Vol. 110; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARRIER DENSITY
DOPED MATERIALS
ELECTRONS
ENERGY GAP
HEMATITE
IRON OXIDES
PHOTOCONDUCTIVITY
PHOTOCURRENTS
PHOTOEMISSION
SPUTTERING
SUBSTRATES
SYNTHESIS
THIN FILMS
TIN OXIDES
TITANIUM