Influence of the Si(111)-7 Multiplication-Sign 7 surface reconstruction on the diffusion of strontium atoms
The diffusion of strontium atoms on the Si(111) surface at room temperature has been investigated using scanning tunnel microscopy and simulation carried out in terms of the density functional theory and the Monte Carlo method. It has been found that the reconstruction of a clean silicon surface with a 7 Multiplication-Sign 7 structure has a profound effect on the diffusion process. The average velocity of motion of a strontium atom in a unit cell of the 7 Multiplication-Sign 7 structure has been calculated. The main diffusion paths of a strontium atom and the corresponding activation energies have been determined. It has been demonstrated that the formation of scanning tunnel microscope images of the Si(111)-7 Multiplication-Sign 7 surface with adsorbed strontium atoms is significantly affected by the shift of the electron density from the strontium atom to the nearest neighbor silicon adatoms in the 7 Multiplication-Sign 7 structure.
- OSTI ID:
- 22027964
- Journal Information:
- Journal of Experimental and Theoretical Physics, Journal Name: Journal of Experimental and Theoretical Physics Journal Issue: 6 Vol. 113; ISSN JTPHES; ISSN 1063-7761
- Country of Publication:
- United States
- Language:
- English
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