Ion induced spinodal dewetting of thin solid films

Journal Article · Mon May 28 00:00:00 EDT 2012 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4724178· OSTI ID:22025576

Repetto, Luca; Setina Batic, Barbara; Firpo, Giuseppe; Piano, Emanuele; Valbusa, Ugo ^[1]

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1. Dipartimento di Fisica, Universita di Genova, Via Dodecaneso 33, 16146 Genova (Italy)

We present experimental data and numerical simulations in order to show that the mechanism of spinodal dewetting is active during ion beam irradiation of thin solid films. The expected scaling law for the characteristic wavelengths versus the initial film thickness is modified by the presence of sputtering. The conclusion is fully supported by model simulation which shows a square law dependence for null sputtering yield and a bimodal trend when sputtering is included. This result is in contrast to earlier studies and opens the possibility to control and use ion induced dewetting for the fabrication of functional nanostructures.

• OSTI ID: 22025576
• Journal Information: Applied Physics Letters, Vol. 100, Issue 22; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
77 NANOSCIENCE AND NANOTECHNOLOGY
CHROMIUM IONS
COMPUTERIZED SIMULATION
DEPOSITION
FABRICATION
ION BEAMS
IRRADIATION
NANOSTRUCTURES
NUMERICAL ANALYSIS
SCALING LAWS
SOLIDS
SPUTTERING
THIN FILMS