In-situ Synchrotron Radiation X-ray Scattering Study On The Initial Structure Of Atomic Layer Deposition

Journal Article · Fri Dec 23 00:00:00 EST 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3666330· OSTI ID:21612383

Park, Y J ^[1]; Lee, D R ^[2]; Baik, S ^[3]

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1. Pohang Accelerator Laboratory, POSTECH, Pohang, Gyeongbuk (Korea, Republic of)
2. Department of Physics, Soongsil univ., Seoul (Korea, Republic of)
3. Department of MSE, POSTECH, Pohang, Gyeongbuk (Korea, Republic of)

Due to the excellent conformality of ALD, it is not only adopted thin film, but also has been adopted for the fabrication of nanostructures. The surface reaction of ALD process is dependent on the substrate condition, thus the study on initial stage of ALD process is crucial to achieve controllable film growth. By the way, because of quite low scattering intensity of initial ultra thin layer, the high flux Synchrotron Radiation is needed. Synchrotron radiation x-ray scattering measurements allow us to investigate the atomic structure evolution of a few nanometer thickness films at the initial growth stage, nondestructively. Ru and TaN ALD films were grown. The thickness, roughness, and electron density were estimated by X-Ray Reflectivity (XRR) analysis. The island structures and its coverage also were estimated.

• OSTI ID: 21612383
• Journal Information: AIP Conference Proceedings, Vol. 1399, Issue 1; Conference: 30. international conference on the physics of semiconductors, Seoul (Korea, Republic of), 25-30 Jul 2010; Other Information: DOI: 10.1063/1.3666330; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
36 MATERIALS SCIENCE
CRYSTAL STRUCTURE
DEPOSITION
ELECTRON DENSITY
FABRICATION
LAYERS
NANOSTRUCTURES
REFLECTIVITY
ROUGHNESS
SUBSTRATES
SURFACES
SYNCHROTRON RADIATION
TANTALUM NITRIDES
THIN FILMS
X RADIATION
X-RAY DIFFRACTION
BREMSSTRAHLUNG
COHERENT SCATTERING
DIFFRACTION
ELECTROMAGNETIC RADIATION
FILMS
IONIZING RADIATIONS
NITRIDES
NITROGEN COMPOUNDS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
PNICTIDES
RADIATIONS
REFRACTORY METAL COMPOUNDS
SCATTERING
SURFACE PROPERTIES
TANTALUM COMPOUNDS
TRANSITION ELEMENT COMPOUNDS