Influence of sputtering power on the high frequency properties of nanogranular FeCoHfO thin films

Journal Article · Fri Apr 01 04:00:00 EDT 2011 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3563063· OSTI ID:21538239

Guangduo, Lu; Huaiwu, Zhang; Feiming, Bai; Xiaoli, Tang; Yuanxun, Li; Zhiyong, Zhong ^[1]; Xiao, John Q ^[2]

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1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 610054 (China)
2. Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716 (United States)

Soft magnetic nanogranular FeCoHfO thin films were fabricated using rf magnetron sputtering in an oxygen/argon ambient. During the deposition process, the partial pressure of oxygen was fixed at 2.5% and sputtering power was used as the control parameter, varying from 50 to 300 W. It was found that the film electrical resistivity ({rho}) decreases steeply with the increase of sputtering power, and the saturation magnetization (4{pi}M{sub s}) and the natural ferromagnetic resonant frequency f{sub r} increase with increasing sputtering power from 50 to 200 W, and then decrease when sputtering power exceeded 200 W. The maximum value of 4{pi}M{sub s} and f{sub r} were 20.5 kG and 3.2GHz, respectively. The coercivity of films had a contrary trend compared with 4{pi}M{sub s} and f{sub r}, and its minimum value was about 1 Oe. The physical origin of the influence was suggested to be related to the structure and composition changes in films.

• OSTI ID: 21538239
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 7 Vol. 109; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
77 NANOSCIENCE AND NANOTECHNOLOGY
COBALT COMPOUNDS
COERCIVE FORCE
DEPOSITION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FERROMAGNETIC MATERIALS
FERROMAGNETIC RESONANCE
FILMS
GRANULAR MATERIALS
HAFNIUM COMPOUNDS
IRON COMPOUNDS
MAGNETIC MATERIALS
MAGNETIC RESONANCE
MAGNETIZATION
MAGNETRONS
MATERIALS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
NANOSTRUCTURES
NONMETALS
OXYGEN
PARTIAL PRESSURE
PHYSICAL PROPERTIES
REFRACTORY METAL COMPOUNDS
RESONANCE
SATURATION
SPUTTERING
THERMODYNAMIC PROPERTIES
THIN FILMS
TRANSITION ELEMENT COMPOUNDS