Thermal activation and saturation of ion beam sculpting

Journal Article · Fri Apr 01 00:00:00 EDT 2011 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3569705· OSTI ID:21538232

Hoogerheide, David P ^[1]; George, H Bola; Aziz, Michael J ^[2]; Golovchenko, Jene A ^[1]

---

1. Physics Department, Harvard University, Cambridge, Massachusetts 02138 (United States)
2. Harvard School of Engineering and Applied Sciences, Cambridge, Massachusetts 02138 (United States)

We report a material-dependent critical temperature for ion beam sculpting of nanopores in amorphous materials under keV ion irradiation. At temperatures below the critical temperature, irradiated pores open at a rate that soon saturates with decreasing temperature. At temperatures above the critical temperature, the pore closing rate rises rapidly and eventually saturates with increasing temperature. The observed behavior is well described by a model based on adatom diffusion, but is difficult to reconcile with an ion-stimulated viscous flow model.

• OSTI ID: 21538232
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 7 Vol. 109; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AUGMENTATION
BEAMS
CHARGED PARTICLES
CRITICAL TEMPERATURE
DIFFUSION
ELEMENTS
ENERGY RANGE
FILMS
FLUID FLOW
ION BEAMS
IONS
KEV RANGE
KEV RANGE 01-10
MATERIALS
PHYSICAL PROPERTIES
SATURATION
SEMICONDUCTOR MATERIALS
SEMIMETALS
SILICON
SILICON COMPOUNDS
SIMULATION
SURFACES
THERMODYNAMIC PROPERTIES
THIN FILMS
TRANSITION TEMPERATURE
VISCOUS FLOW