Temperature dependent electrical transport behavior of InN/GaN heterostructure based Schottky diodes
- Materials Research Centre, Indian Institute of Science, Bangalore 560012 (India)
- Office of Principal Scientific Advisor, Government of India, New Delhi 110011 (India)
- Central Research Laboratory, Bharat Electronics, Bangalore 560013 (India)
InN/GaN heterostructure based Schottky diodes were fabricated by plasma-assisted molecular beam epitaxy. The temperature dependent electrical transport properties were carried out for InN/GaN heterostructure. The barrier height and the ideality factor of the Schottky diodes were found to be temperature dependent. The temperature dependence of the barrier height indicates that the Schottky barrier height is inhomogeneous in nature at the heterostructure interface. The higher value of the ideality factor and its temperature dependence suggest that the current transport is primarily dominated by thermionic field emission (TFE) other than thermionic emission (TE). The room temperature barrier height obtained by using TE and TFE models were 1.08 and 1.43 eV, respectively.
- OSTI ID:
- 21538104
- Journal Information:
- Journal of Applied Physics, Vol. 109, Issue 4; Other Information: DOI: 10.1063/1.3549685; (c) 2011 American Institute of Physics; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
FIELD EMISSION
GALLIUM NITRIDES
INDIUM NITRIDES
INTERFACES
ISOTOPIC EXCHANGE
MOLECULAR BEAM EPITAXY
PHOSPHORUS COMPOUNDS
PLASMA
SCHOTTKY BARRIER DIODES
SEMICONDUCTOR MATERIALS
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0273-0400 K
THERMIONIC EMISSION
CRYSTAL GROWTH METHODS
EMISSION
EPITAXY
GALLIUM COMPOUNDS
INDIUM COMPOUNDS
MATERIALS
NITRIDES
NITROGEN COMPOUNDS
PNICTIDES
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
TEMPERATURE RANGE