Multidiagnostic analysis of ultrafast laser ablation of metals with pulse pair irradiation

Journal Article · Wed Dec 01 04:00:00 EST 2010 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3516491· OSTI ID:21537954

Amoruso, S; Bruzzese, R ^[1]; Wang, X ^[2]; O'Connell, G; Lunney, J G ^[3]

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1. Dipartimento di Scienze Fisiche, Universita degli Studi di Napoli Federico II, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli (Italy)
2. CNR-SPIN, Complesso Universitario di Monte S. Angelo, Via Cintia, I-80126 Napoli (Italy)
3. School of Physics, Trinity College-Dublin, Dublin 2 (Ireland)

Copper targets are irradiated in the ablation regime by pairs of equal, time-delayed collinear laser pulses separated on a timescale going from {approx_equal}2 ps to {approx_equal}2 ns. The ablation plume is characterized by ion probe diagnostic, fast imaging, and temporally and spatially resolved optical emission spectroscopy. The variation in the ablation efficiency with the delay between the pulses is analyzed by measuring the ablation crater profile with a contact profilometer. The second laser pulse modifies the characteristics of the plasma plume produced by the first pulse and the ablation efficiency. The different mechanisms involved in double pulse ultrafast laser ablation are identified and discussed. The experimental findings are interpreted in the frame of a simple model of the interaction of the second pulse with the nascent ablation plume produced by the first pulse. This model yields consistent and quantitative agreement with the experimental findings predicting the observed experimental trends of the ablation depth reduction and ion yield increase with the delay between the pulses, as well as the characteristic timescale of the observed changes. The possibility of controlling the characteristics of the plumes produced during ultrafast laser ablation via an efficient coupling of the energy of the second pulse to the various ablation components produced by the first pulse is of particular interest in ultrafast pulsed laser deposition and microprobe analyses of materials.

• OSTI ID: 21537954
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 108; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ABLATION
CHARGED PARTICLES
CHEMICAL ANALYSIS
COPPER
COUPLING
DEPOSITION
EFFICIENCY
ELECTROMAGNETIC RADIATION
ELEMENTS
EMISSION SPECTROSCOPY
ENERGY BEAM DEPOSITION
HYDROGEN COMPOUNDS
INTERACTIONS
ION MICROPROBE ANALYSIS
ION PROBES
IONS
IRRADIATION
LASER RADIATION
METALS
MICROANALYSIS
NONDESTRUCTIVE ANALYSIS
OXYGEN COMPOUNDS
PLASMA
PLUMES
PROBES
PULSED IRRADIATION
RADIATIONS
RESOLUTION
SIMULATION
SPECTROSCOPY
SURFACE COATING
TIME DELAY
TRANSITION ELEMENTS
VELOCITY
WATER