Nanostructured carbon films with oriented graphitic planes

Journal Article · Mon Mar 21 00:00:00 EDT 2011 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3570625· OSTI ID:21518342

Teo, E H. T.; Kalish, R ^[1]; Kulik, J ^[2]; Kauffmann, Y ^[3]; Lifshitz, Y ^[1]

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1. Solid State Institute, Technion, Israel Institute of Technology, Haifa 32000 (Israel)
2. Materials Research Institute, Penn State University, University Park, PA 16208 (United States)
3. Department of Materials Engineering, Technion, Israel Institute of Technology, Haifa 32000 (Israel)

Nanostructured carbon films with oriented graphitic planes can be deposited by applying energetic carbon bombardment. The present work shows the possibility of structuring graphitic planes perpendicular to the substrate in following two distinct ways: (i) applying sufficiently large carbon energies for deposition at room temperature (E>10 keV), (ii) utilizing much lower energies for deposition at elevated substrate temperatures (T>200 deg. C). High resolution transmission electron microscopy is used to probe the graphitic planes. The alignment achieved at elevated temperatures does not depend on the deposition angle. The data provides insight into the mechanisms leading to the growth of oriented graphitic planes under different conditions.

• OSTI ID: 21518342
• Journal Information: Applied Physics Letters, Vol. 98, Issue 12; Other Information: DOI: 10.1063/1.3570625; (c) 2011 American Institute of Physics; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
CARBON
DEPOSITION
GRAPHITE
GROWTH
ION BEAMS
KEV RANGE
MATERIALS
NANOSTRUCTURES
RESOLUTION
SUBSTRATES
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
BEAMS
ELECTRON MICROSCOPY
ELEMENTS
ENERGY RANGE
FILMS
MICROSCOPY
MINERALS
NONMETALS
TEMPERATURE RANGE