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Growth of multilayers of Bi{sub 2}Se{sub 3}/ZnSe: Heteroepitaxial interface formation and strain

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3548865· OSTI ID:21518263
 [1]; ; ;  [1]; ;  [2]
  1. Department of Physics, University of Hong Kong, Pokfulam Road (Hong Kong)
  2. Department of Physics, Hong Kong University of Science and Technology, Kowloon (Hong Kong)
Multilayers of Bi{sub 2}Se{sub 3}/ZnSe with the periodicity of a few nanometers were grown by molecular-beam epitaxy on Si(111). While epitaxial growth of Bi{sub 2}Se{sub 3} on ZnSe proceeded by two-dimensional nucleation, ZnSe growth on Bi{sub 2}Se{sub 3} showed the three-dimensional growth front. Therefore, the two complementary interfaces of Bi{sub 2}Se{sub 3}/ZnSe were asymmetric in morphological properties. Strain-relaxation rates were found to differ between epitaxial ZnSe and Bi{sub 2}Se{sub 3}, which could be attributed to the specific growth modes and the properties of Bi{sub 2}Se{sub 3} and ZnSe surfaces.
OSTI ID:
21518263
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 4 Vol. 98; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English