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High mobility two-dimensional electron gases in nitride heterostructures with high Al composition AlGaN alloy barriers

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3523358· OSTI ID:21518191
; ; ;  [1]
  1. Department of Electrical Engineering, University of Notre Dame, Indiana 46556 (United States)
We report high-electron mobility nitride heterostructures with >70% Al composition AlGaN alloy barriers grown by molecular beam epitaxy. Direct growth of such AlGaN layers on GaN resulted in hexagonal trenches and a low mobility polarization-induced charge. By applying growth interruption at the heterojunction, the surface morphology improved dramatically and the room temperature two-dimensional electron gas (2DEG) mobility increased by an order of magnitude, exceeding 1300 cm{sup 2}/V s. The 2DEG density was tunable at 0.4-3.7x10{sup 13}/cm{sup 2} by varying the total barrier thickness (t). Surface barrier heights of the heterostructures were extracted and exhibited dependence on t.
OSTI ID:
21518191
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 22 Vol. 97; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English