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Title: Optimization and Characterisation of Amorphous Iron Disilicide formed by Ion Beam Mixing of Fe/Si Multilayer Structures for Photovoltaic Applications

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3548379· OSTI ID:21510105
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  1. Ion Beam Centre, University of Surrey, Guildford, UK GU2 7XH (United Kingdom)

This study presents an optimization and characterization of amorphous Iron Disilicide (a-FeSi{sub 2}) synthesized using Ion Beam Mixing (IBM) of Fe/Si multilayer structures. The layers were deposited using RF magnetron sputtering, and subsequently irradiated with Ar{sup +} and Fe{sup +} beams of 150 and 200 keV. Rutherford Back Scattering (RBS) analysis was used to determine the structure and level of silicidation of the samples. The nature of the band-gap and the optical absorption coefficients were determined by optical transmission analysis. The results demonstrate that the synthesis of a-FeSi{sub 2} can be achieved using this technique, with the total level of silicidation being highly dependant upon the initial structure configuration and beam parameters. Direct band-gap energies of {approx}0.90 eV have been observed for those samples with the highest levels of silicidation, with optical absorption coefficients of {approx}10{sup 4} cm{sup -1}. Therefore this method of fabrication has been shown to produce a-FeSi{sub 2} layers without the need for post-synthesis treatment, using established technologies without compromising the optical properties that make this material such a promising semiconductor for the photovoltaics market.

OSTI ID:
21510105
Journal Information:
AIP Conference Proceedings, Vol. 1321, Issue 1; Conference: IIT 2010: 18. international conference on ion implantation technology, Kyoto (Japan), 6-11 Jun 2010; Other Information: DOI: 10.1063/1.3548379; (c) 2010 American Institute of Physics; ISSN 0094-243X
Country of Publication:
United States
Language:
English