Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Plasma diagnostics for investigating extreme ultraviolet light sources

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3486220· OSTI ID:21483629
 [1];  [2];  [3]
  1. National Centre for Plasma Science and Technology (NCPST), Dublin City University, Glasnevin, Dublin, Leinster 01 (Ireland)
  2. School of Physics, UCD, Belfield (Ireland)
  3. School of Physical Sciences, Dublin City University, Glasnevin, Dublin, Leinster 01 (Ireland)
Plasma temperature and density diagnostics are crucial for lithographic applications of extreme ultraviolet light sources. One widely used technique employs line intensity ratios of successively charged ion states to determine the ion temperature (T{sub ionz}). This work comprises a detailed ''stress-test'' of the applied technique, where space and time resolved emission in laser-produced plasmas were studied, using a Nd:yttrium aluminum garnet laser pulse incident on an aluminum target in the 26.5-32.5 nm range. Detailed hydrodynamic simulations also investigate the dependency of ion temperature on electron density and the charge states for various line combinations (Al VI/V, Al VII/VI, Al VIII/VII, Al IX/VIII, and Al X/IX).
OSTI ID:
21483629
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 9 Vol. 108; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English