Effects of substrate temperature and Cu underlayer thickness on the formation of SmCo{sub 5}(0001) epitaxial thin films

Journal Article · Sat May 15 04:00:00 EDT 2010 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3334539· OSTI ID:21476204

Ohtake, Mitsuru; Nukaga, Yuri; Futamoto, Masaaki ^[1]; Kirino, Fumiyoshi ^[2]

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1. Faculty of Science and Engineering, Chuo University, Bunkyo-ku, Tokyo 112-8551 (Japan)
2. Graduate School of Fine Arts, Tokyo National University of Fine Arts and Music, Taito-ku, Tokyo 110-8714 (Japan)

SmCo{sub 5}(0001) epitaxial thin films were prepared on Cu(111) underlayers heteroepitaxially grown on Al{sub 2}O{sub 3}(0001) single-crystal substrates by molecular beam epitaxy. The effects of substrate temperature and Cu underlayer thickness on the crystallographic properties of SmCo{sub 5}(0001) epitaxial films were investigated. The Cu atoms of underlayer diffuse into the SmCo{sub 5} film and substitute the Co sites in SmCo{sub 5} structure forming an alloy compound of Sm(Co,Cu){sub 5}. The ordered phase formation is enhanced with increasing the substrate temperature and with increasing the Cu underlayer thickness. The Cu atom diffusion into the SmCo{sub 5} film is assisting the formation of Sm(Co,Cu){sub 5} ordered phase.

• OSTI ID: 21476204
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 9 Vol. 107; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALLOYS
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
CHALCOGENIDES
COBALT ALLOYS
COPPER
CRYSTAL GROWTH
CRYSTAL GROWTH METHODS
CRYSTAL STRUCTURE
CRYSTALS
DIFFUSION
ELEMENTS
EPITAXY
FILMS
LAYERS
METALS
MOLECULAR BEAM EPITAXY
MONOCRYSTALS
OXIDES
OXYGEN COMPOUNDS
RARE EARTH ALLOYS
SAMARIUM ALLOYS
SUBSTRATES
TEMPERATURE DEPENDENCE
THIN FILMS
TRANSITION ELEMENT ALLOYS
TRANSITION ELEMENTS