Size dependent strengthening mechanisms in sputtered Fe/W multilayers
- Department of Mechanical Engineering, Materials Science and Engineering Program, Texas A and M University, College Station, Texas 77843-3123 (United States)
- Department of Electrical and Computer Engineering, Texas A and M University, College Station, Texas 77843-3128 (United States)
We investigate size dependent strengthening mechanisms in sputtered Fe/W multilayers with individual layer thickness, h, varying from 1 to 200 nm. Microstructure analyses reveal that Fe/W has incoherent bcc/bcc interface when h is greater than 5 nm. When h decreases to 1-2.5 nm, the interface becomes semicoherent, and Fe and W show significant lattice distortions comparing to their bulk counterpart due to interface constraint. The layer thickness dependent drastic variations in x-ray diffraction profiles are simulated well by using an analytical model. Film hardness increases with decreasing h, and approaches a maximum value of 12.5 GPa when h is 1 nm. The layer thickness dependent film hardnesses are compared with analytical models. Koehler's image force plays a major role in determining the maximum strength of composites at smaller h.
- OSTI ID:
- 21476178
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 9 Vol. 107; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BCC LATTICES
COHERENT SCATTERING
COMPOSITE MATERIALS
CRYSTAL LATTICES
CRYSTAL STRUCTURE
CUBIC LATTICES
DEPOSITION
DIFFRACTION
DIMENSIONS
ELEMENTS
FILMS
HARDNESS
IMPACT STRENGTH
INTERFACES
IRON
LAYERS
MATERIALS
MECHANICAL PROPERTIES
METALS
MICROSTRUCTURE
PRESSURE RANGE
PRESSURE RANGE GIGA PA
REFRACTORY METALS
SCATTERING
SPUTTERING
SURFACE COATING
THICKNESS
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN
X-RAY DIFFRACTION