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Pulsed chemical HF laser with a large discharge gap

Journal Article · · Quantum Electronics (Woodbury, N.Y.)
; ; ;  [1];  [2]
  1. Russian Science Centre 'Applied Chemistry', St Petersburg (Russian Federation)
  2. Laboratoire de Physique des Gaz et des Plasmas, Universite Paris-Sud, Orsay (France)
The characteristics of the radiation emitted by an electric-discharge pulsed chemical HF laser with a discharge gap of 10 cm are studied. The discharge was stabilised by a semiconducting ferroelectric ceramic layer deposited on plane metal electrodes. The specific energy and technical efficiency were 3 J L{sup -1} and 3.4%, respectively, for a laser operating on a nonchain reaction in SF{sub 6}-H{sub 2} mixture and 25 J L{sup -1} and 26%, respectively, for a laser operating on a chain reaction in F{sub 2}-O{sub 2}-SF{sub 6}-H{sub 2} mixture. (lasers)
OSTI ID:
21470638
Journal Information:
Quantum Electronics (Woodbury, N.Y.), Journal Name: Quantum Electronics (Woodbury, N.Y.) Journal Issue: 11 Vol. 34; ISSN 1063-7818
Country of Publication:
United States
Language:
English