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Title: Action of the 216-nm fifth harmonic of a Nd:YAP laser on photosensitive germanosilicate glass films

Journal Article · · Quantum Electronics (Woodbury, N.Y.)
;  [1]; ; ; ;  [2]
  1. Institute of Applied Physics, Russian Academy of Sciences, Nizhnii Novgorod (Russian Federation)
  2. Fiber Optics Research Center, Russian Academy of Sciences, Moscow (Russian Federation)

The absorption spectrum, refractive index, and relief of the surface of a germanosilicate glass film are studied upon the non-destructive action of the 216-nm (5.75-eV) fifth harmonic of a repetitively pulsed Nd:YAP laser. It is shown that laser irradiation of films induces a strong photorefractive effect despite the relatively low absorption coefficient. For the 100-mJ cm{sup -2} energy density and above, two-photon process make a noticeable contribution to the absorption of laser radiation at 216 nm. The diffraction efficiency of photoinduced phase gratings achieved {approx}7x10{sup -3} for the exposure dose {approx}6 kJ cm{sup -2}, which corresponds to the induced refractive index 1.5x10{sup -3}. At higher exposure doses, a relief appears on a film surface and the diffraction efficiency of a phase grating is reduced. (interaction of laser radiation with matter. laser plasma)

OSTI ID:
21470410
Journal Information:
Quantum Electronics (Woodbury, N.Y.), Vol. 33, Issue 11; Other Information: DOI: 10.1070/QE2003v033n11ABEH002530; ISSN 1063-7818
Country of Publication:
United States
Language:
English