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Title: Photoemission Studies of Metallic Photocathodes Prepared by Pulsed Laser Ablation Deposition Technique

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3521345· OSTI ID:21428716
; ;  [1];  [2];  [3]
  1. National Institute of Nuclear Physics and Physics Department, University of Salento, Via Arnesano, 73100-Lecce (Italy)
  2. Laboratorio de Metalografia, Dpto. Ingenieria Mecanica y Naval, Facultad de Ingenieria, Universidad de Buenos Aires (Argentina)
  3. National Institute of Nuclear Physics, National Laboratories, Frascati (Italy)

We present the results of our investigation on metallic films as suitable photocathodes for the production of intense electron beams in RF photoinjector guns. Pulsed laser ablation deposition technique was used for growing Mg and Y thin films onto Si and Cu substrates in high vacuum and at room temperature.Different diagnostic methods were used to characterize the thin films deposited on Si with the aim to optimize the deposition process. Photoelectron performances were investigated on samples deposited on Cu substrate in an ultra high vacuum photodiode chamber at 10{sup -7} Pa. Relatively high quantum efficiencies have been obtained for the deposited films, comparable to those of corresponding bulks. Samples could stay for several months in humid open air before being tested in a photodiode cell. The deposition process and the role of the photocathode surface contamination and its influence on the photoelectron performances are presented and discussed.

OSTI ID:
21428716
Journal Information:
AIP Conference Proceedings, Vol. 1288, Issue 1; Conference: International Commission for Optics topical meeting on emerging trends and novel materials in photonics, Delphi (Greece), 7-9 Oct 2010; Other Information: DOI: 10.1063/1.3521345; (c) 2010 American Institute of Physics; ISSN 0094-243X
Country of Publication:
United States
Language:
English