X-ray and EUV Emission Studies of Copper Vacuum Spark Plasma

Journal Article · Wed Jul 07 00:00:00 EDT 2010 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3469706· OSTI ID:21410550

Chan, L S; Ghomeishi, M; Yap, S L; Wong, C S ^[1]

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1. Plasma Research Laboratory, Physics Department, Faculty of Science, University of Malaya, 50603 KualaLumpur (Malaysia)

A vacuum spark system with a copper anode and electrode of gap 1.5 mm is investigated for the purpose of developing it as a possible radiation source for Next Generation Lithography (NGL). At discharge voltage in the range of 10 to 15 kV and an ambient pressure of about 10{sup -3} mbar, both X-ray (measured by PIN diode) and extreme ultraviolet, EUV (measured by SXUV5A with integrated filter) can be measured simultaneously when good pinching discharge as indicated by sharp dip in the waveform of the rate of current is achieved. For discharge with mild pinching, only EUV emission is observed.

• OSTI ID: 21410550
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1250; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ABLATION
ANODES
COPPER
CURRENTS
ELECTRIC POTENTIAL
ELECTRODES
ELECTROMAGNETIC RADIATION
ELEMENTS
EMISSION
EXTREME ULTRAVIOLET RADIATION
FILTERS
FLUIDS
IONIZING RADIATIONS
LASERS
LIQUIDS
METALS
NATURAL GAS LIQUIDS
PHOTODIODES
PLASMA
RADIATION SOURCES
RADIATIONS
SEMICONDUCTOR DEVICES
SEMICONDUCTOR DIODES
TRANSITION ELEMENTS
ULTRAVIOLET RADIATION
WAVE FORMS
X RADIATION
X-RAY LASERS