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Photocurrent Enhancement Induced By Interface Modifications Due To Low Dose Electron Irradiation Of Amorphous/Crystalline Silicon Heterojunctions

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3295356· OSTI ID:21371392
;  [1]; ;  [2]; ;  [3]
  1. DIIIE, Universita di Salerno, Via Ponte Don Melillo 1, 84084 Fisciano (Saudi Arabia) (Italy)
  2. Chair of Electronic Devices, University Hagen, Haldener Str. 182, 58084 Hagen (Germany)
  3. DIMES-ECTM, Delft University of Technology, P.O. Box 5053, 2600 GB Delft (Netherlands)
A series of n-type amorphous silicon/p-type crystalline silicon solar cells has been exposed to different fluences of 1 MeV electrons. For intermediate fluences up to 1.10{sup 13} electrons/cm{sup 2}, an enhancement of the spectral response at shorter wavelengths and a increase of the short circuit current has been observed, while for higher fluences the usual device degradation due to the decrease of the charge carrier diffusion length in the crystalline silicon base after irradiation has been found.
OSTI ID:
21371392
Journal Information:
AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1199; ISSN APCPCS; ISSN 0094-243X
Country of Publication:
United States
Language:
English