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Title: Interaction of vacuum ultraviolet light with a low-k organosilicate glass film in the presence of NH{sub 3}

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3466905· OSTI ID:21367019
 [1]; ;  [2]; ; ; ; ;  [3]
  1. Department of Physics, University of North Texas, Denton, Texas 76203 (United States)
  2. Department of Chemical Engineering, University of California-Berkeley, Berkeley, California 94549 (United States)
  3. Department of Chemistry, University of North Texas, Denton, Texas 76203 (United States)

In situ x-ray photoemission spectroscopy (XPS) and ex situ Fourier transform infrared spectroscopy (FTIR) were used to characterize effects on organosilicate films of 147 nm irradiation in the presence of 10{sup -4} Torr NH{sub 3}. XPS and FTIR data indicate Si-O and Si-C bond scission, with nitridation only at Si sites. Photoirradiation causes the surface layer to become enriched in sp{sup 2} carbon. FTIR spectra of silanol formation upon exposure to ambient indicate reactive sites in the bulk have lifetimes of up to six days. XPS data indicate lifetimes of approxminutes for surface states. Nitrogen uptake passivates with longer exposure times, indicating surface densification.

OSTI ID:
21367019
Journal Information:
Applied Physics Letters, Vol. 97, Issue 3; Other Information: DOI: 10.1063/1.3466905; (c) 2010 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English