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Title: Nonlinear refraction properties of nickel oxide thin films at 800 nm

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3254233· OSTI ID:21361906
; ;  [1]
  1. Departamento de Fisica, Universidade Federal de Pernambuco, Recife 50670-901, PE (Brazil)

Measurements of the nonlinear refractive index, n{sub 2}, of nickel oxide films prepared by controlled oxidation of nickel films deposited on substrates of soda-lime glass are reported. The structure and morphology of the samples were characterized by scanning electron microscopy, atomic force microscopy, and x-ray diffractometry. Samples of excellent optical quality were prepared. The nonlinear measurements were performed using the thermally managed eclipse Z-scan technique at 800 nm. A large value of n{sub 2}approx =10{sup -12} cm{sup 2}/W and negligible nonlinear absorption were obtained.

OSTI ID:
21361906
Journal Information:
Journal of Applied Physics, Vol. 106, Issue 9; Other Information: DOI: 10.1063/1.3254233; (c) 2009 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English