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Title: Discharge characteristics of He-Ne-Xe gas mixture with varying Xe contents and at varying sustain electrode gap lengths in the plasma display panel

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3224960· OSTI ID:21361830
;  [1];  [2]
  1. Plasma Laboratory, Inter-University Semiconductor Research Center, Department of Electrical and Computer Engineering, College of Engineering, Seoul National University, Seoul 151-742 (Korea, Republic of)
  2. Information and Electronics Research Institute, School of Electrical Engineering and Computer Science, Korea Advanced Institute of Science and Technology, Daejon 305-701 (Korea, Republic of)

The discharge characteristics of He-Ne-Xe gas mixture in the plasma display panel were investigated using a two-dimensional numerical simulation to understand the effects of adding He and varying the Xe contents in the gas mixture, and also varying sustain electrode gap. With 5% Xe content and 60 mum sustain electrode gap, decreased ionization led to the improvement of the vacuum ultraviolet (vuv) efficacy at increasing He mixing ratios. However, at 20% Xe content and 60 mum sustain electrode gap, increased electron heating improved the vuv efficacy until the He mixing ratio reached 0.7, but the efficacy decreased beyond the ratio of 0.7 due to the increased ionization of Xe atoms. At 5% Xe content and 200 mum sustain electrode gap, the vuv efficacy increased as a result of increased electron heating at the gap space at increasing He mixing ratios.

OSTI ID:
21361830
Journal Information:
Journal of Applied Physics, Vol. 106, Issue 6; Other Information: DOI: 10.1063/1.3224960; (c) 2009 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English