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Title: Tailoring a plasma focus as hard x-ray source for imaging

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3291039· OSTI ID:21347243
 [1]; ;  [2]
  1. Department of Physics, University of Sargodha, 40100 Sargodha (Pakistan)
  2. Department of Physics, Quaid-i-Azam University, 45320 Islamabad (Pakistan)

An investigation on temporal and spatial properties of hard x-rays (15-88 keV) emitted in a 5.3 kJ plasma focus using Si pin diodes and a pinhole camera is reported. The maximum yield of hard x-rays of 15-88 keV range is estimated about 4.7 J and corresponding efficiency for x-ray generation is 0.09%. The x-rays with energy >15 keV have 15-20 ns pulse duration and approx1 mm source size. This radiation is used for contact x-ray imaging of biological and compound objects and spatial resolution of approx50 mum is demonstrated.

OSTI ID:
21347243
Journal Information:
Applied Physics Letters, Vol. 96, Issue 3; Other Information: DOI: 10.1063/1.3291039; (c) 2010 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English