Ion Beam And Plasma Jet Generated By A 3 kJ Plasma Focus

Journal Article · Tue Jul 07 04:00:00 EDT 2009 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3192291· OSTI ID:21344277

Lim, L K; Ngoi, S K; Yap, S L; Wong, C S ^[1]; Saadah, A R ^[2]

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1. Plasma Research Laboratory, Physics Department, Science Faculty, University of Malaya, 50603 Kuala Lumpur (Malaysia)
2. Solid State Research Laboratory, Physics Department, Science Faculty, University of Malaya, 50603 Kuala Lumpur (Malaysia)

The plasma focus device is well known as a copious source of X-ray, neutrons, ion and electron beams. In this work, the characteristics of energetic ion beam emission in a 3 kJ Mather-type plasma focus is studied. The plasma focus system is operated at low pressure with argon as the working gas. The objective of the project is to obtain the argon ion beam and the plasma jet. The ion beam and plasma jet are used for material processing. In order to investigate the effect of the ion beam and plasma jet, crystalline silicon substrates are placed above the anode. Samples obtained after irradiation with the plasma focus discharge are analyzed by using the Scanning electron microscopy (SEM) and Energy Dispersive X-ray spectroscopy (EDX).

• OSTI ID: 21344277
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1150; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ARGON IONS
BEAMS
CHARGED PARTICLES
ELECTRIC DISCHARGES
ELECTRON BEAMS
ELECTRON MICROSCOPY
ELEMENTS
EMISSION
FILMS
ION BEAMS
ION EMISSION
IONS
IRRADIATION
LEPTON BEAMS
MICROSCOPY
OPEN PLASMA DEVICES
PARTICLE BEAMS
PLASMA
PLASMA FOCUS
PLASMA FOCUS DEVICES
PLASMA JETS
PLASMA PRESSURE
SCANNING ELECTRON MICROSCOPY
SEMIMETALS
SILICON
SPECTROSCOPY
THERMONUCLEAR DEVICES
THIN FILMS
X-RAY SPECTROSCOPY