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Oxygen permeation through electrochemical vapor deposited solid oxide membranes

Conference ·
OSTI ID:213137
;  [1]
  1. Univ. of Cincinnati, OH (United States)

Dense thin yttria doped zirconia membranes were coated on the surface of porous alumina ceramic supports by the electrochemical vapor deposition method. The oxygen permeation through these thin dense oxide membranes were measured at several different temperatures (800-1000{degrees}C) in a high temperature CVD reactor. A new approach was employed to derive theoretical equations for oxygen permeation through various types of thin dense oxide membranes. These equations, which took into account both the surface reactions and the bulk diffusion, were employed to describe the electrochemical vapor deposition kinetics and the oxygen permeation through these thin dense oxide membranes. Theoretical analysis and experimental data show that the surface permeation constant is directly related to the oxygen isotope exchange coefficient measured under equilibrium conditions. For oxygen permeation through yttria doped zirconia membranes the surface reaction becomes the rate limiting step when the film thickness approaches 0.5 {mu}m, with a maximum oxygen permeation flux of about 5x10{sup -8} mol/cm{sup 2} s at 1000{degrees}C. The dependence of the oxygen permeation flux on oxygen partial pressure and membrane thickness will be discussed for oxygen permeation through fast ionic conducting oxide membranes.

OSTI ID:
213137
Report Number(s):
CONF-940713--
Country of Publication:
United States
Language:
English