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Title: Observation of ultralow-level Al impurities on a silicon surface by high-resolution grazing emission x-ray fluorescence excited by synchrotron radiation

Journal Article · · Physical Review. B, Condensed Matter and Materials Physics
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  1. Institute of Physics, Jan Kochanowski University, 25-406 Kielce (Poland)
  2. Department of Physics, University of Fribourg, CH-1700 Fribourg (Switzerland)
  3. European Synchrotron Radiation Facility (ESRF), F-38043 Grenoble (France)

We demonstrate that ultralow-level Al impurities on a silicon surface can be measured by using the high-resolution grazing emission x-ray fluorescence (GEXRF) technique combined with synchrotron-radiation excitation. An Al-impurity level of about 10{sup 12} atoms/cm{sup 2} was reached by observing the Al K{alpha} x-ray fluorescence in the resonant Raman-scattering background-''free'' regime by choosing an appropriate beam energy below the Si K absorption edge. Present results show that by combining the GEXRF method with the vapor phase decomposition technique the 10{sup 7} atoms/cm{sup 2} level can be reached for Al detection on silicon. Finally, we found that the high-resolution GEXRF technique is a sensitive tool to study the morphology of surface nanostructures.

OSTI ID:
21294337
Journal Information:
Physical Review. B, Condensed Matter and Materials Physics, Vol. 80, Issue 11; Other Information: DOI: 10.1103/PhysRevB.80.113305; (c) 2009 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1098-0121
Country of Publication:
United States
Language:
English