Observation of ultralow-level Al impurities on a silicon surface by high-resolution grazing emission x-ray fluorescence excited by synchrotron radiation
- Institute of Physics, Jan Kochanowski University, 25-406 Kielce (Poland)
- Department of Physics, University of Fribourg, CH-1700 Fribourg (Switzerland)
- European Synchrotron Radiation Facility (ESRF), F-38043 Grenoble (France)
We demonstrate that ultralow-level Al impurities on a silicon surface can be measured by using the high-resolution grazing emission x-ray fluorescence (GEXRF) technique combined with synchrotron-radiation excitation. An Al-impurity level of about 10{sup 12} atoms/cm{sup 2} was reached by observing the Al K{alpha} x-ray fluorescence in the resonant Raman-scattering background-''free'' regime by choosing an appropriate beam energy below the Si K absorption edge. Present results show that by combining the GEXRF method with the vapor phase decomposition technique the 10{sup 7} atoms/cm{sup 2} level can be reached for Al detection on silicon. Finally, we found that the high-resolution GEXRF technique is a sensitive tool to study the morphology of surface nanostructures.
- OSTI ID:
- 21294337
- Journal Information:
- Physical Review. B, Condensed Matter and Materials Physics, Vol. 80, Issue 11; Other Information: DOI: 10.1103/PhysRevB.80.113305; (c) 2009 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1098-0121
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
ALUMINIUM OXIDES
DECOMPOSITION
DETECTION
EMISSION SPECTRA
EXCITATION
FLUORESCENCE
IMPURITIES
K ABSORPTION
NANOSTRUCTURES
RAMAN EFFECT
RAMAN SPECTRA
RESOLUTION
SEMICONDUCTOR MATERIALS
SILICON
SURFACES
SYNCHROTRON RADIATION
VAPORS
X RADIATION
X-RAY SPECTRA