Spatial nonuniformity of electron energy in a microwave atmospheric-pressure microplasma

Journal Article · Mon Apr 13 00:00:00 EDT 2009 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3119316· OSTI ID:21294011

Liguo, Zhu ^[1]; Zhibo, Zhang ^[1]; Ximing, Zhu; Yikang, Pu ^[1]; Zeren, Li ^[2]

---

1. Department of Engineering Physics, Tsinghua University, Beijing 100084 (China)
2. Institute of Fluid Physics, China Academy of Engineering Physics, Mianyang, Sichuan 621900 (China)

The characteristics of the electron energy in a microwave atmospheric-pressure argon microplasma are investigated by a spatially resolved optical emission spectroscopy. By adding tiny amount of xenon (<1 ppm) as tracer gas into the argon discharge, it is found that the spatial distribution of the electrons with energy >8.3 eV is quite different from that of the electrons with energy >11.5 eV. Spatial distribution of the population ratio between 4p and 5p levels of Ar atom is also determined. Furthermore, with a collisional-radiative model, it is found that the spatial variation of this population ratio is mainly attributed to the spatial nonuniformity of the effective electron temperature.

• OSTI ID: 21294011
• Journal Information: Applied Physics Letters, Vol. 94, Issue 15; Other Information: DOI: 10.1063/1.3119316; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON
ATMOSPHERIC PRESSURE
ELECTRON TEMPERATURE
ELECTRONS
EMISSION SPECTROSCOPY
EV RANGE
ION TEMPERATURE
MICROWAVE RADIATION
PLASMA DIAGNOSTICS
SPATIAL DISTRIBUTION
XENON