Effect of nonlinear Landau damping in plasma-based backward Raman amplifier

Journal Article · Wed Jul 15 04:00:00 EDT 2009 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.3160606· OSTI ID:21277282

Yampolsky, N A; Fisch, N J ^[1]

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1. Department of Astrophysical Sciences, Princeton University, Princeton, New Jersey 08544 (United States)

A plasma wave can mediate laser coupling in a plasma-based resonant backward Raman amplifier for high power amplification of short laser pulses. The resonant nature of amplification requires a long lifetime of the plasma wave. However, the plasma wave can be heavily Landau damped in warm plasma. On the other hand, Landau damping can be saturated in the presence of a strong plasma wave. We study backward Raman amplifier in the nonlinear regime of Landau damping using a simplified fluid model. We find the regime in which initially high linear Landau damping can be significantly saturated. Because of the saturation effect, higher temperatures can be tolerated in achieving efficient amplification. The plasma temperature can be as much as 50% larger compared to the case of unsaturated Landau damping.

• OSTI ID: 21277282
• Journal Information: Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 7 Vol. 16; ISSN PHPAEN; ISSN 1070-664X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
BEAM-PLASMA SYSTEMS
ELECTRON TEMPERATURE
ION TEMPERATURE
LANDAU DAMPING
NONLINEAR PROBLEMS
PLASMA WAVES