Study of the Plasma near the Plasma Electrode by Probes and Photodetachment in ECR-driven Negative Ion Source

Journal Article · Thu Mar 12 00:00:00 EDT 2009 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3112547· OSTI ID:21269133

Bacal, M; Svarnas, P ^[1]; Bechu, S; Pelletier, J ^[2]

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1. LPTP, UMR CNRS 7648, Ecole Polytechnique, 91128 Palaiseau (France)
2. Laboratoire de Physique Subatomique et de Cosmologie, UMR CNRS 5821, 53 rue des Martyrs, 38026 Grenoble (France)

The effect of the plasma electrode bias on the plasma characteristics near the extraction aperture in a large volume hybrid multicusp negative ion source, driven by 2.45 GHz microwaves, is reported. Spatially resolved negative ion and electron density measurements were performed under various pressures (1-4 mTorr) by means of electrostatic probe and photodetachment technique.

• OSTI ID: 21269133
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1097; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ANIONS
APERTURES
ELECTRODES
ELECTRON CYCLOTRON-RESONANCE
ELECTRON DENSITY
ELECTRON DETACHMENT
ELECTROSTATIC PROBES
GHZ RANGE 01-100
MICROWAVE RADIATION
PLASMA