Micro/Nanomanufacturing in Support of Materials Science
- Singapore Synchrotron Light Source (SSLS) National University of Singapore 5 Research Link, Singapore 117603 (Singapore)
- Department of Physics, National University of Singapore 2 Science Drive, Singapore 117542 (Singapore)
With its LiMiNT facility (Lithography for Micro- and Nanotechnology), Singapore Synchrotron Light Source (SSLS) provides a one-stop shop for micro/nano fabrication on large areas (typically 4'' diameter). Synchrotron deep X-ray lithography, eventually enhanced by the super-resolution process, is used to simultaneously pattern large numbers of micro/nano structures into a resist. Laser direct writer or electron beam serve as primary pattern generators, in particular, for mask making. Structure heights of >1 mm, aspect ratios of >200, and minimum sizes of <200 nm have been achieved, not necessarily simultaneously. Such structures may be replicated into a variety of metals and plastics. Tilting, rotating of the mask-substrate stack during exposure enables the parallel production of nearly 3D structures. Application fields include electromagnetic metamaterials, X-ray and infrared optics, photonics, lasers, quantum technology, precision manufacturing, and fluidics. SSLS is serving a growing community of users and customers.
- OSTI ID:
- 21260221
- Journal Information:
- AIP Conference Proceedings, Vol. 1092, Issue 1; Conference: 6. international conference on synchrotron radiation in materials science, Campinas (Brazil), 20-23 Jul 2008; Other Information: DOI: 10.1063/1.3086203; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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