Angle Control on the Optima HE/XE Ion Implanter

Journal Article · Mon Nov 03 00:00:00 EST 2008 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3033641· OSTI ID:21251689

Bell, Edward; Satoh, Shu ^[1]

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1. Axcelis Technologies, Inc 108 Cherry Hill Drive, Beverly, MA 01915 (United States)

The Optima HE/XE is the latest generation of high energy ion implanter from Axcelis, combining proven RF linear accelerator technology with new single wafer processing. The architecture of the implanter is designed to provide a parallel beam at the wafer plane over the full range of implant energies and beam currents. One of the advantages of this system is the ability to control both the horizontal and vertical implant angles for each implant. Included in the design is the ability to perform in situ measurements of the horizontal and vertical angles of the beam in real time. The method of the horizontal and vertical angle measurements is described in this paper.

• OSTI ID: 21251689
• Journal Information: AIP Conference Proceedings, Vol. 1066, Issue 1; Conference: 17. international conference on ion implantation technology, Monterey, CA (United States), 8-13 Jun 2008; Other Information: DOI: 10.1063/1.3033641; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
BEAM CURRENTS
CONTROL SYSTEMS
HELIUM IONS
ION BEAMS
ION IMPLANTATION
LINEAR ACCELERATORS
XENON IONS