Dust Successive Generations in Ar/SiH{sub 4} : Dust Cloud Dynamics

Journal Article · Sun Sep 07 00:00:00 EDT 2008 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.2997132· OSTI ID:21251278

Cavarroc, M; Mikikian, M; Tessier, Y; Boufendi, L ^[1]

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1. GREMI, CNRS-Universite d'Orleans, 14 rue dIssoudun, BP 6744, 45067 Orleans cedex 2 (France)

Silane-based plasmas are widely used to deposit nanostructured silicon thin films or to synthesize silicon nanoparticles. Dust particle formation in Ar/SiH{sub 4} plasmas is a continuous phenomenon: as long as silane precursors are provided, new dust generations are formed. Successive generations can be monitored thanks to various electrical (V{sub dc}/3H) and optical (OES, video imaging) diagnostics. Experiments presented in this paper have been performed in a capacitively-coupled radiofrequency discharge, at low pressure (12 Pa) in an Argon/Silane mixture (92:8)

• OSTI ID: 21251278
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1041; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ARGON
DRIFT INSTABILITY
DUSTS
MAGNETOHYDRODYNAMICS
MIXTURES
NANOSTRUCTURES
PARTICLES
PLASMA
PLASMA DIAGNOSTICS
PLASMA WAVES
RF SYSTEMS
SILANES
THIN FILMS