UV/VUV high sensitivity absorption spectroscopy
- Department of Physics, University of Wisconsin, 1150 University Avenue, Madison, Wisconsin 53706 (United States)
High sensitivity absorption spectroscopy is a powerful diagnostic technique for reactive glow discharges plasmas. Absolute column densities of many chemical radicals have been measured in both deposition and etching plasmas. Modern photodiode or charge-coupled device (CCD) detector arrays vastly increase the sensitivity of traditional absorption experiments enabling one to observe fractional absorptions of ultraviolet (UV) and vacuum ultraviolet (VUV) radiation less than 0.0001. Stable arc lamps provide a continuum source in some experiments, but experiments at very high spectral resolution or at VUV wavelengths require the greater spectral radiance of synchrotron radiation. High sensitivity absorption spectroscopy has been applied to intense glow discharges used for lighting, for diamond film deposition, and for both depositing and etching Si films. Absorption spectroscopy provides absolute column densities, is useful for transitions that do not fluoresce, and approaches the sensitivity of laser-induced fluorescence (LIF) in glow discharges under some conditions.
- OSTI ID:
- 21202604
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 443; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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